发明授权
- 专利标题： Polyurea sag control agent in polytrimethylene ether diol
- 专利标题（中）： 聚三亚甲基醚二醇中的聚脲下垂控制剂
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申请号： US13039354申请日： 2011-03-03
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公开(公告)号： US08153711B1公开(公告)日： 2012-04-10
- 发明人: Ayumu Yokoyama , Rajesh Gopalan Saliya , Hari Babu Sunkara
- 申请人： Ayumu Yokoyama , Rajesh Gopalan Saliya , Hari Babu Sunkara
- 代理商 Brian J Myers
- 主分类号： C08L75/02
- IPC分类号： C08L75/02 ; C08G18/48
摘要：
The present disclosure relates to a sag control composition consisting essentially of the reaction product of an amine and a polyisocyanate and polytrimethylene ether diol. The sag control composition can be used for providing further compositions that have excellent sag resistance, especially on vertical surfaces. The sag control composition can also provide compositions having a relatively lower content of organic solvent when compared to previously known sag control compositions.
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