Invention Grant
- Patent Title: Combined etching and doping media
- Patent Title (中): 组合蚀刻和掺杂介质
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Application No.: US12246516Application Date: 2008-10-07
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Publication No.: US08148191B2Publication Date: 2012-04-03
- Inventor: Sylke Klein , Armin Kübelbeck , Werner Stockum , Wilfried Schmidt , Berthold Schum
- Applicant: Sylke Klein , Armin Kübelbeck , Werner Stockum , Wilfried Schmidt , Berthold Schum
- Applicant Address: DE Darmstadt
- Assignee: Merck Patent GmbH
- Current Assignee: Merck Patent GmbH
- Current Assignee Address: DE Darmstadt
- Agency: Millen, White, Zelano, Branigan, P.C.
- Priority: DE10150040 20011010
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/00 ; H01L31/18
Abstract:
The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.
Public/Granted literature
- US20090071540A1 COMBINED ETCHING AND DOPING MEDIA Public/Granted day:2009-03-19
Information query
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