发明授权
- 专利标题: Non-volatile semiconductor storage device and method of manufacturing the same
- 专利标题(中): 非易失性半导体存储装置及其制造方法
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申请号: US12562402申请日: 2009-09-18
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公开(公告)号: US08138489B2公开(公告)日: 2012-03-20
- 发明人: Hiroyasu Tanaka , Masaru Kidoh , Ryota Katsumata , Masaru Kito , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Yoshiaki Fukuzumi
- 申请人: Hiroyasu Tanaka , Masaru Kidoh , Ryota Katsumata , Masaru Kito , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Yoshiaki Fukuzumi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2008-287881 20081110
- 主分类号: H01L47/00
- IPC分类号: H01L47/00
摘要:
A non-volatile semiconductor storage device includes a plurality of memory element groups, each of the memory element groups having a plurality of memory elements, each of the memory elements having a resistance-change element and a Schottky diode connected in series. Each of the memory element groups includes: a first columnar layer extending in a lamination direction; a first insulation layer formed on a side surface of the first columnar layer and functioning as the resistance-change element; and a first conductive layer formed to surround the first columnar layer via the first insulation layer. The first conductive layer is formed of metal. The first columnar layer is formed of a semiconductor having such a impurity concentration that the first conductive layer and the semiconductor configure the Schottky diode.
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