发明授权
US08137869B2 Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby 有权
光学元件,光刻设备,用于制造和/或保护光学元件的方法,由此制造的器件制造方法和器件

  • 专利标题: Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby
  • 专利标题(中): 光学元件,光刻设备,用于制造和/或保护光学元件的方法,由此制造的器件制造方法和器件
  • 申请号: US10936716
    申请日: 2004-09-09
  • 公开(公告)号: US08137869B2
    公开(公告)日: 2012-03-20
  • 发明人: Levinus Pieter Bakker
  • 申请人: Levinus Pieter Bakker
  • 申请人地址: NL Veldhoven
  • 专利权人: ASML Netherlands, B.V.
  • 当前专利权人: ASML Netherlands, B.V.
  • 当前专利权人地址: NL Veldhoven
  • 代理机构: Pillsbury Winthrop Shaw Pittman LLP
  • 优先权: EP03077850 20030910
  • 主分类号: G02B27/44
  • IPC分类号: G02B27/44 G02B5/18
Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby
摘要:
A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.
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