Invention Grant
- Patent Title: Process for producing ceramic substrate
- Patent Title (中): 陶瓷基板的制造方法
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Application No.: US12888450Application Date: 2010-09-23
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Publication No.: US08123882B2Publication Date: 2012-02-28
- Inventor: Kazuo Kishida , Hiroaki Yamada
- Applicant: Kazuo Kishida , Hiroaki Yamada
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2008-077398 20080325
- Main IPC: B29C65/00
- IPC: B29C65/00 ; C03B29/00

Abstract:
A shrinkage suppression layer used in the production of a ceramic substrate according to a non-shrinkage process provides favorable removal performance while sufficiently ensuring the restraining performance of the shrinkage suppression layer. Resin beads, which disappear at a temperature lower than the sintering temperature of a low-temperature sintering ceramic material of a base material layer to form open bores in a shrinkage suppression layer, are added to the shrinkage suppression layer and dispersed uniformly at least in a principal surface direction. The shrinkage suppression layer provides sufficient restraining performance to the base material layer in the step of firing, and after the firing, forms open bores, thereby improving the removal performance of the shrinkage suppression layer.
Public/Granted literature
- US20110011516A1 PROCESS FOR PRODUCING CERAMIC SUBSTRATE Public/Granted day:2011-01-20
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