发明授权
- 专利标题: Nitride semi-conductor light emitting device and a process of producing a nitride semi-conductor light emitting device
- 专利标题(中): 氮化物半导体发光器件和制造氮化物半导体发光器件的工艺
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申请号: US12621364申请日: 2009-11-18
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公开(公告)号: US08120013B2公开(公告)日: 2012-02-21
- 发明人: Takayoshi Takano , Kenji Tsubaki , Hideki Hirayama , Sachie Fujikawa
- 申请人: Takayoshi Takano , Kenji Tsubaki , Hideki Hirayama , Sachie Fujikawa
- 申请人地址: JP Osaka JP Saitama
- 专利权人: Panasonic Electric Works Co., Ltd.,Riken
- 当前专利权人: Panasonic Electric Works Co., Ltd.,Riken
- 当前专利权人地址: JP Osaka JP Saitama
- 代理机构: Cheng Law Group, PLLC
- 优先权: JP2009-104407 20090422
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A nitride semi-conductor light emitting device has a p-type nitride semi-conductor layer 7, an n-type nitride semi-conductor layer 3, and a light emission layer 6 which is interposed between the p-type nitride semi-conductor layer 7 and the n-type nitride semi-conductor layer 3. The light emission layer 6 has a quantum well structure with a barrier layer 6b and a well layer 6a. The barrier layer 6b is formed of AlaGabIn(1-a-b)N (0 0), and contains a first impurity at a concentration of A greater than zero. The well layer 6a is formed of AlcGadIn(1-c-d)N (0 0), and contains a second impurity at a concentration of B equal to or greater than zero. In the nitride semi-conductor light emitting device of the present invention, the concentration of A is larger than that of B, in order that the barrier layer 6b has a concentration of oxygen smaller than that in the well layer 6a.
公开/授权文献
- US20100270532A1 NITRIDE SEMI-CONDUCTOR LIGHT EMITTING DEVICE 公开/授权日:2010-10-28
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