发明授权
- 专利标题： Composition containing medicine extremely slightly soluble in water and method for preparation thereof
- 专利标题（中）： 含有极微溶于水的药物的组合物及其制备方法
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申请号： US10551901申请日： 2004-04-28
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公开(公告)号： US08101207B2公开(公告)日： 2012-01-24
- 发明人: Hiroshi Miura , Makoto Kanebako , Masayuki Kanishi , Yasuo Shinoda , Toshio Inagi , Hirofumi Takeuchi
- 申请人： Hiroshi Miura , Makoto Kanebako , Masayuki Kanishi , Yasuo Shinoda , Toshio Inagi , Hirofumi Takeuchi
- 申请人地址： JP Nagoya-shi
- 专利权人： Kowa Co., Ltd.
- 当前专利权人： Kowa Co., Ltd.
- 当前专利权人地址： JP Nagoya-shi
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 国际申请： PCT/JP2004/006141 WO 20040428
- 国际公布： WO2004/096280 WO 20041111
- 主分类号： A61K9/20
- IPC分类号： A61K9/20 ; A61K47/02 ; A61K47/04 ; A61K31/50
摘要：
A composition containing a very low water-soluble drug, which composition is produced by treating, with a supercritical or subcritical carbon dioxide fluid, a mixture containing a very low water-soluble drug and a porous material (exclusive of a porous silica material characterized in that the material has an average pore diameter of 1 to 20 nm, the total pore volume of the material that have a diameter falling within a range of ±40% of the average pore diameter account for 60% or more the volume of all the pores of the material, and, when subjected to X-ray diffractometry, the material exhibits one or more peaks at a diffraction angle (2θ) corresponding to d of 1 nm or more); and a method for producing the composition.The very-low-water-soluble-drug-containing composition of the present invention ensures improved dissolution of the very low water-soluble drug.
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