发明授权
- 专利标题: Method of transferring a substrate, transfer system and lithographic projection apparatus
- 专利标题(中): 转印基板,转印系统和光刻投影装置的方法
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申请号: US12248290申请日: 2008-10-09
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公开(公告)号: US08086348B2公开(公告)日: 2011-12-27
- 发明人: Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen
- 申请人: Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: G06F7/00
- IPC分类号: G06F7/00
摘要:
A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provided on the first substrate holder. Subsequently, a position error of the substrate is measured, and positioning adjustment data are calculated based on the position error as measured. Then, the second substrate holder is moved relative to a reference position thereof in accordance with the positioning adjustment data. Finally, the substrate is transferred by means of the transfer unit from the first substrate holder to the second substrate holder in accordance with the transfer data, and placed on the second substrate holder as moved.
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