发明授权
US08068662B2 Method and system for determining a defect during charged particle beam inspection of a sample
有权
用于确定样品的带电粒子束检查期间的缺陷的方法和系统
- 专利标题: Method and system for determining a defect during charged particle beam inspection of a sample
- 专利标题(中): 用于确定样品的带电粒子束检查期间的缺陷的方法和系统
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申请号: US12414130申请日: 2009-03-30
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公开(公告)号: US08068662B2公开(公告)日: 2011-11-29
- 发明人: Zhao-Li Zhang , Wei Fang , Jack Jau
- 申请人: Zhao-Li Zhang , Wei Fang , Jack Jau
- 申请人地址: TW Hsinchu
- 专利权人: Hermes Microvision, Inc.
- 当前专利权人: Hermes Microvision, Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Rosenberg, Klein & Lee
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A method for determining a defect during charged particle beam inspection of a sample locates at least one examination region within a charged particle microscopic image of the sample by making reference to a database graphic of the sample corresponding to the charged particle microscopic image. Each located examination region concerns at least one element of the sample, and each element has at least one characteristic in common. At least one point response value is then generated for each point in the located examination regions. The presence of a defect at the location of the concerned point is then determined by applying at least one decision tree operator to the generated point response values of the concerned point. Applications of the proposed method as a computing agent and a charged particle beam inspection system are also disclosed.
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