发明授权
US08049274B2 Semiconductor integrated circuit and method of manufacturing the same 有权
半导体集成电路及其制造方法

Semiconductor integrated circuit and method of manufacturing the same
摘要:
A semiconductor integrated circuit includes a semiconductor substrate, a plurality of trenches formed to extend in one direction in the semiconductor substrate, at least one connecting trench connecting at least two of the plurality of trenches to each other, a plurality of trench transistors including a plurality of gate electrodes, each gate electrode partially filling a corresponding trench, and a capping layer filling the at least one connecting trench.
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