Invention Grant
- Patent Title: Semiconductor device with a non-volatile memory and resistor
- Patent Title (中): 具有非易失性存储器和电阻器的半导体器件
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Application No.: US11174536Application Date: 2005-07-06
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Publication No.: US08044450B2Publication Date: 2011-10-25
- Inventor: Mitsuhiro Noguchi , Susumu Yoshikawa , Koichi Fukuda
- Applicant: Mitsuhiro Noguchi , Susumu Yoshikawa , Koichi Fukuda
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-109075 20050405
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A semiconductor device comprising a resistance element with a high resistance and high resistance accuracy and a non-volatile semiconductor storage element is rationally realized by comprising the non-volatile semiconductor storage element comprising a first isolation formed to isolate a first semiconductor area, a first insulator, and a first electrode in a self-aligned manner, and a second electrode, and the resistance element comprising a second isolation formed to isolate a second semiconductor area, a third insulator and a conductor layer in a self-aligned manner, and third and fourth electrodes formed on each end of the conductor layer via a fourth insulator, and connected with the conductor layer. The conductor layer or the third and fourth electrodes include the same material with the first or second electrode, respectively.
Public/Granted literature
- US20060220003A1 Semiconductor device Public/Granted day:2006-10-05
Information query
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