发明授权
- 专利标题： Method of forming patterns
- 专利标题（中）： 形成图案的方法
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申请号： US12137371申请日： 2008-06-11
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公开(公告)号： US08017298B2公开(公告)日： 2011-09-13
- 发明人: Hideaki Tsubaki
- 申请人： Hideaki Tsubaki
- 申请人地址： JP Tokyo
- 专利权人： Fujifilm Corporation
- 当前专利权人： Fujifilm Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2007-155323 20070612
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/26 ; G03F7/32
摘要：
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.
公开/授权文献
- US20080318171A1 METHOD OF FORMING PATTERNS 公开/授权日：2008-12-25
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