Invention Grant
- Patent Title: Apparatus for sub-wavelength near-field focusing of electromagnetic waves
- Patent Title (中): 用于电磁波的亚波长近场聚焦的装置
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Application No.: US12123434Application Date: 2008-05-19
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Publication No.: US08003965B2Publication Date: 2011-08-23
- Inventor: Anthony Grbic , Roberto D. Merlin
- Applicant: Anthony Grbic , Roberto D. Merlin
- Applicant Address: US MI Ann Arbor
- Assignee: The Regents of the University of Michigan
- Current Assignee: The Regents of the University of Michigan
- Current Assignee Address: US MI Ann Arbor
- Agency: Marshall, Gerstein & Borun LLP
- Main IPC: G21K1/00
- IPC: G21K1/00 ; G02B3/00

Abstract:
Planar sub-wavelength structures provide superlensing, i.e., electromagnetic focusing beyond the diffraction limit. The planar structures use diffraction to force the input field to converge to a spot on the focal plane. The sub-wavelength patterned structures manipulate the output wave in such a manner as to form a sub-wavelength focus in the near field. In some examples, the sub-wavelength structures may be linear grating-like structures that can focus electromagnetic radiation to lines of arbitrarily small sub-wavelength dimension, or two dimensional grating-like structures and Bessel (azimuthally symmetric) structures that can focus to spots of arbitrarily small sub-wavelength dimensions. The particular pattern for the sub-wavelength structures may be derived from the desired focus. Some examples describe sub-wavelength structures that have been implemented to focus microwave radiation to sub-wavelength dimensions in the near field.
Public/Granted literature
- US20090303154A1 Apparatus for Sub-Wavelength Near-Field Focusing of Electromagnetic Waves Public/Granted day:2009-12-10
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