发明授权
- 专利标题： Photoresist composition and method of manufacturing a display substrate using the same
- 专利标题（中）： 光刻胶组合物及其制造方法
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申请号： US12891940申请日： 2010-09-28
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公开(公告)号： US07981706B2公开(公告)日： 2011-07-19
- 发明人: Jeong-Min Park , Jung-Soo Lee , Won-Young Chang , Eun-Sang Lee , In-Ho Yu , Seong-Hyeon Kim
- 申请人： Jeong-Min Park , Jung-Soo Lee , Won-Young Chang , Eun-Sang Lee , In-Ho Yu , Seong-Hyeon Kim
- 申请人地址： KR KR
- 专利权人： Samsung Electronics Co., Ltd.,Dongwoo Fine-Chem
- 当前专利权人： Samsung Electronics Co., Ltd.,Dongwoo Fine-Chem
- 当前专利权人地址： KR KR
- 代理机构： Cantor Colburn LLP
- 优先权： KR2009-0101988 20091027
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A photoresist composition includes an alkali-soluble resin, a dissolution inhibitor including a quinone diazide compound, a first additive including a benzenol compound represented by the following Chemical Formula 1, a second additive including an acrylic copolymer represented by the following Chemical Formula 2 and an organic solvent. Accordingly, heat resistance of a photoresist pattern may be improved, and the photoresist pattern may be readily stripped. As a result, crack formation in the photoresist pattern may be reduced and/or prevented.
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