发明授权
US07977491B2 Dendron and dendrimer, method of producing the same, and method of producing a thioacetal compound
失效
树胶，树枝状大分子，其制造方法和硫代缩醛化合物的制造方法
- 专利标题： Dendron and dendrimer, method of producing the same, and method of producing a thioacetal compound
- 专利标题（中）： 树胶，树枝状大分子，其制造方法和硫代缩醛化合物的制造方法
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申请号： US10594430申请日： 2005-03-28
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公开(公告)号： US07977491B2公开(公告)日： 2011-07-12
- 发明人: Koki Nakamura
- 申请人： Koki Nakamura
- 申请人地址： JP Minato-Ku, Tokyo
- 专利权人： Fujifilm Corporation
- 当前专利权人： Fujifilm Corporation
- 当前专利权人地址： JP Minato-Ku, Tokyo
- 代理机构： Buchanan Ingersoll & Rooney PC
- 优先权： JP2004-095408 20040329; JP2004-096073 20040329; JP2004-096080 20040329
- 国际申请： PCT/JP2005/006545 WO 20050328
- 国际公布： WO2005/092847 WO 20051006
- 主分类号： C07D498/00
- IPC分类号： C07D498/00 ; C07C255/00 ; C07C321/00
摘要：
A dendron or dendrimer, which has, as a recurring unit of each branch, a structure of formula (I): wherein TC designates a linkage to a former generation in the direction to a focal point of the dendron or a core of the dendrimer; TT designates a linkage to a next generation in the direction to a terminal; X is a divalent group comprised of at least one heteroatom; L1 and L2 each are a divalent linking group; R is a hydrogen atom or a substituent; and a method of producing a dendron or a dendrimer; and a method of producing a thioacetal compound.
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