发明授权
- 专利标题: Process for producing thiazole compound
- 专利标题(中): 制备噻唑化合物的方法
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申请号: US11918004申请日: 2006-04-05
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公开(公告)号: US07977490B2公开(公告)日: 2011-07-12
- 发明人: Kazuyuki Tanaka , Naoyuki Takano , Shinzo Seko
- 申请人: Kazuyuki Tanaka , Naoyuki Takano , Shinzo Seko
- 申请人地址: JP Tokyo
- 专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2005-110702 20050407
- 国际申请: PCT/JP2006/307682 WO 20060405
- 国际公布: WO2006/109811 WO 20061019
- 主分类号: C07D277/28
- IPC分类号: C07D277/28
摘要:
A process for producing a thiazole compound of the formula (3): wherein X1 is a hydrogen atom or a halogen atom, which comprises reacting a compound of the formula (1): wherein X1 is as defined above, and X2 represents a halogen atom, with ammonia and formaldehyde to obtain a hexahydrotriazine compound of the formula (2): wherein X1 is as defined above, and reacting the resulting hexahydrotriazine compound with hydroxylamine under acidic conditions. According to this process, the thiazole compound of the formula (3) can be industrially advantageously produced using inexpensive ammonia with suppressing the formation of a byproduct of the formula (4): wherein X1 is as defined above.
公开/授权文献
- US20110054185A1 PROCESS FOR PRODUCING THIAZOLE COMPOUND 公开/授权日:2011-03-03
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