发明授权
- 专利标题: Heat treatment apparatus and heat treatment method
- 专利标题(中): 热处理设备及热处理方法
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申请号: US11871241申请日: 2007-10-12
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公开(公告)号: US07965927B2公开(公告)日: 2011-06-21
- 发明人: Kenichi Yokouchi , Jun Watanabe
- 申请人: Kenichi Yokouchi , Jun Watanabe
- 申请人地址: JP
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Ostrolenk Faber LLP
- 优先权: JP2006-293876 20061030
- 主分类号: A21B2/00
- IPC分类号: A21B2/00
摘要:
In a heat treatment apparatus, a holding part moves upwardly to receive a semiconductor wafer transported into a chamber and placed on support pins. The semiconductor wafer held in close proximity to a light-transmittable plate by the holding part is preheated by a hot plate, and is then flash-heated by a flash of light emitted from flash lamps. Thereafter, the holding part moves downwardly to transfer the semiconductor wafer to the support pins, and the semiconductor wafer is transported out of the chamber. Then, a new semiconductor wafer is transported into the chamber. The holding part is adapted to perform such a series of operations of moving upwardly and downwardly also when in a standby condition pending the transport of the first semiconductor wafer in a lot into the chamber.
公开/授权文献
- US20080101780A1 HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD 公开/授权日:2008-05-01
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