Invention Grant
- Patent Title: Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
- Patent Title (中): 薄膜晶体管基板及其制造方法以及用于制造薄膜晶体管基板的掩模
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Application No.: US12755920Application Date: 2010-04-07
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Publication No.: US07960221B2Publication Date: 2011-06-14
- Inventor: Do Gi Lim , Jong Hwan Lee , Hong Woo Lee , Yong Jo Kim , Yong Woo Lee
- Applicant: Do Gi Lim , Jong Hwan Lee , Hong Woo Lee , Yong Jo Kim , Yong Woo Lee
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2006-0010831 20060203; KR10-2006-0012147 20060208
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84

Abstract:
A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.
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