发明授权
US07923340B2 Method to reduce collector resistance of a bipolar transistor and integration into a standard CMOS flow 有权
降低双极晶体管的集电极电阻并集成到标准CMOS流中的方法

Method to reduce collector resistance of a bipolar transistor and integration into a standard CMOS flow
摘要:
The invention, in one aspect, provides a method for fabricating a semiconductor device. In one aspect, the method provides for a dual implantation of a tub of a bipolar transistor. The tub in bipolar region is implanted by implanting the tub through separate implant masks that are also used to implant tubs associated with MOS fabricate different voltage devices in a non-bipolar region during the fabrication of MOS transistors.
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