Invention Grant
- Patent Title: Electrical connection through a substrate to a microelectromechanical device
- Patent Title (中): 通过基板电连接到微机电装置
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Application No.: US11877786Application Date: 2007-10-24
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Publication No.: US07915696B2Publication Date: 2011-03-29
- Inventor: David Cecil Hays , Marco Francesco Aimi , Christopher Fred Keimel , Glenn Scott Claydon , Kanakasabapathi Subramanian , Oliver Charles Boomhower
- Applicant: David Cecil Hays , Marco Francesco Aimi , Christopher Fred Keimel , Glenn Scott Claydon , Kanakasabapathi Subramanian , Oliver Charles Boomhower
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Richard D. Emery
- Main IPC: H01L29/82
- IPC: H01L29/82

Abstract:
An electrical through-connection, or via, that passes through a substrate to a bus on a first surface of the substrate. The via may be configured with an interlock such that the electrically conductive core of the via is constrained to thermally expand towards the second surface, away from the bus, thus preventing damage to the bus. The interlock may be a local constriction or enlargement of the via near the first surface of the substrate. The via may be greater in length along the bus than a unit spacing of beams in a parallel microswitch array actuated in unison along the bus. The via may be narrower in width than in length, and may form a trapezoidal geometry that is larger at the second surface of the substrate than at the first surface.
Public/Granted literature
- US20090107812A1 ELECTRICAL CONNECTION THROUGH A SUBSTRATE TO A MICROELECTROMECHANICAL DEVICE Public/Granted day:2009-04-30
Information query
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