发明授权
- 专利标题: Three-stage formation of thin-films for photovoltaic devices
- 专利标题(中): 用于光伏器件的三阶段薄膜形成
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申请号: US12603285申请日: 2009-10-21
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公开(公告)号: US07910396B2公开(公告)日: 2011-03-22
- 发明人: Sergey Frolov , Allan James Bruce , Michael Cyrus
- 申请人: Sergey Frolov , Allan James Bruce , Michael Cyrus
- 申请人地址: US NJ South Plainfield
- 专利权人: Sunlight Photonics, Inc.
- 当前专利权人: Sunlight Photonics, Inc.
- 当前专利权人地址: US NJ South Plainfield
- 代理机构: Mayer & Williams PC
- 代理商 Stuart H. Mayer
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for producing a film of compound semiconductor includes providing a substrate and a compound bulk material having a first chemical composition that includes at least one first chemical element and a second chemical element. A film is deposited on the substrate using the compound bulk material as a single source of material. The deposited film has a composition substantially the same as the first chemical composition. A residual chemical reaction is induced in the deposited film using a source containing the second chemical element to thereby increase the content of the second chemical element in the deposited film so that the deposited film has a second chemical composition. The film may be employed in a photovoltaic device.
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