Invention Grant
- Patent Title: Ferroelectric recording medium and writing method for the same
- Patent Title (中): 铁电记录介质和写入方法相同
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Application No.: US12128788Application Date: 2008-05-29
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Publication No.: US07889628B2Publication Date: 2011-02-15
- Inventor: Hyoung-soo Ko , Eun-sik Kim , Sung-dong Kim , Ju-hwan Jung , Hong-sik Park , Chul-min Park , Seung-bum Hong
- Applicant: Hyoung-soo Ko , Eun-sik Kim , Sung-dong Kim , Ju-hwan Jung , Hong-sik Park , Chul-min Park , Seung-bum Hong
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2005-0011410 20050207
- Main IPC: G11B7/00
- IPC: G11B7/00

Abstract:
A ferroelectric recording medium and a writing method for the same are provided. The ferroelectric recording medium includes a ferroelectric layer which reverses its polarization when receiving a predetermined coercive voltage. A nonvolatile anisotrophic conduction layer is formed on the ferroelectric layer. A resistance of the anisotrophic conduction layer decreases when receiving a first voltage lower than the coercive voltage, and the resistance of the anisotrophic conduction layer increases when receiving a second voltage higher than the coercive voltage. Multi-bit information is stored by a combination of polarization states of the ferroelectric layer and the resistance of the anisotrophic conduction layer. Accordingly, multiple bits can be expressed on one domain of the ferroelectric recording medium.
Public/Granted literature
- US20080225678A1 FERROELECTRIC RECORDING MEDIUM AND WRITING METHOD FOR THE SAME Public/Granted day:2008-09-18
Information query
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