An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates. The apparatus includes a (a) chamber member having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure; (b) at least one linearly extending vapor source member for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting member adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor member for continuously moving the substrate/workpiece mounting/supporting member transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting member.