发明授权
- 专利标题： Mask defect inspection computer program product
- 专利标题（中）： 面膜缺陷检查计算机程序产品
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申请号： US11980640申请日： 2007-10-31
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公开(公告)号： US07821628B2公开(公告)日： 2010-10-26
- 发明人: Shinji Yamaguchi , Soichi Inoue , Satoshi Tanaka , Mari Inoue
- 申请人： Shinji Yamaguchi , Soichi Inoue , Satoshi Tanaka , Mari Inoue
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2002-260428 20020905; JP2002-268659 20020913
- 主分类号： G01N21/00
- IPC分类号： G01N21/00
摘要：
A mask defect inspecting method comprises preparing detection sensitivities of defects on a plurality of portions of a mask pattern on a photomask, the detection sensitivities being determined according to influences of the defects upon a wafer, and inspecting defects on the plurality of portions based on the detection sensitivities.
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