发明授权
- 专利标题： Shape-based photolithographic model calibration
- 专利标题（中）： 基于形状的光刻模型校准
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申请号： US11974499申请日： 2007-10-11
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公开(公告)号： US07805699B2公开(公告)日： 2010-09-28
- 发明人: Ir Kusnadi , Yuri Granik
- 申请人： Ir Kusnadi , Yuri Granik
- 专利权人： Mentor Graphics Corporation
- 当前专利权人： Mentor Graphics Corporation
- 代理机构： Klarquist Sparkman, LLP
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method and apparatus for determining how well a photolithographic model simulates a photolithographic printing process. A test pattern of features is printed on a wafer and the shape of the printed features is compared with the shape of simulated features produced by the model. A cost function is calculated from the comparison that quantifies how well the model simulates the photolithographic printing process.
公开/授权文献
- US20090100389A1 Shape-based photolithographic model calibration 公开/授权日：2009-04-16
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