发明授权
- 专利标题: Dual triggered silicon controlled rectifier
- 专利标题(中): 双触发可控硅整流器
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申请号: US12146456申请日: 2008-06-26
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公开(公告)号: US07777277B2公开(公告)日: 2010-08-17
- 发明人: Kei-Kang Hung
- 申请人: Kei-Kang Hung
- 申请人地址: TW Hsinchu Science Park, Hsinchu
- 专利权人: Raydium Semiconductor Corporation
- 当前专利权人: Raydium Semiconductor Corporation
- 当前专利权人地址: TW Hsinchu Science Park, Hsinchu
- 代理商 Winston Hsu
- 优先权: TW97102622A 20080124
- 主分类号: H01L23/62
- IPC分类号: H01L23/62
摘要:
The present invention provides a dual triggered silicon controlled rectifier (DTSCR) including: a semiconductor substrate, an N-well, a P-well, a first N+ diffusion region and a first P+ diffusion region, a second N+ diffusion region and a second P+ diffusion region; a third P+ diffusion region, positioned in one side of the DTSCR and across the N-well and the P-well; a third N+ diffusion region, positioned in another side of the DTSCR and across the N-well and the P-well; a first gate, positioned above the N-well between the second and the third P+ diffusion regions, utilized as a P-type trigger node to receive a first trigger current or a first trigger voltage; and a second gate, positioned above the P-well between the first and the third N+ diffusion regions, utilized as an N-type trigger node to receive a second trigger current or a second trigger voltage.
公开/授权文献
- US20090189183A1 DUAL TRIGGERED SILICON CONTROLLED RECTIFIER 公开/授权日:2009-07-30
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