发明授权
US07777277B2 Dual triggered silicon controlled rectifier 有权
双触发可控硅整流器

  • 专利标题: Dual triggered silicon controlled rectifier
  • 专利标题(中): 双触发可控硅整流器
  • 申请号: US12146456
    申请日: 2008-06-26
  • 公开(公告)号: US07777277B2
    公开(公告)日: 2010-08-17
  • 发明人: Kei-Kang Hung
  • 申请人: Kei-Kang Hung
  • 申请人地址: TW Hsinchu Science Park, Hsinchu
  • 专利权人: Raydium Semiconductor Corporation
  • 当前专利权人: Raydium Semiconductor Corporation
  • 当前专利权人地址: TW Hsinchu Science Park, Hsinchu
  • 代理商 Winston Hsu
  • 优先权: TW97102622A 20080124
  • 主分类号: H01L23/62
  • IPC分类号: H01L23/62
Dual triggered silicon controlled rectifier
摘要:
The present invention provides a dual triggered silicon controlled rectifier (DTSCR) including: a semiconductor substrate, an N-well, a P-well, a first N+ diffusion region and a first P+ diffusion region, a second N+ diffusion region and a second P+ diffusion region; a third P+ diffusion region, positioned in one side of the DTSCR and across the N-well and the P-well; a third N+ diffusion region, positioned in another side of the DTSCR and across the N-well and the P-well; a first gate, positioned above the N-well between the second and the third P+ diffusion regions, utilized as a P-type trigger node to receive a first trigger current or a first trigger voltage; and a second gate, positioned above the P-well between the first and the third N+ diffusion regions, utilized as an N-type trigger node to receive a second trigger current or a second trigger voltage.
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