Invention Grant
- Patent Title: Semiconductor light emitting element
- Patent Title (中): 半导体发光元件
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Application No.: US11850404Application Date: 2007-09-05
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Publication No.: US07763907B2Publication Date: 2010-07-27
- Inventor: Koichi Tachibana , Hajime Nago , Shinji Saito , Shinya Nunoue , Genichi Hatakoshi
- Applicant: Koichi Tachibana , Hajime Nago , Shinji Saito , Shinya Nunoue , Genichi Hatakoshi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-014664 20070125
- Main IPC: H01L33/22
- IPC: H01L33/22 ; H01L33/14 ; H01L33/38

Abstract:
A semiconductor light emitting element includes: an {0001} n-type semiconductor substrate formed of a III-V semiconductor, which is in a range of 0° to 45° in inclination angle into a direction, and which is in a range of 0° to 10° in inclination angle into a direction; an n-type layer formed of a III-V semiconductor on the n-type semiconductor substrate; an n-type guide layer formed of a III-V semiconductor above the n-type layer; an active layer formed of a III-V semiconductor above the n-type guide layer; a p-type first guide layer formed of a III-V semiconductor above the active layer; a p-type contact layer formed of a III-V semiconductor above the p-type first guide layer; and an concavo-convex layer formed of a III-V semiconductor between the p-type first guide layer and the p-type contact layer. The concavo-convex layer has concave portions and convex portions which are alternately and regularly arranged at a top face thereof, and has lower p-type impurity concentration than that of the p-type contact layer.
Public/Granted literature
- US20080179623A1 SEMICONDUCTOR LIGHT EMITTING ELEMENT Public/Granted day:2008-07-31
Information query
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