发明授权
- 专利标题： Alignment and alignment marks
- 专利标题（中）： 对齐和对准标记
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申请号： US11194758申请日： 2005-08-02
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公开(公告)号： US07751047B2公开(公告)日： 2010-07-06
- 发明人: Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel
- 申请人： Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G01B11/00
- IPC分类号： G01B11/00 ; H01L23/544 ; G03F9/00 ; H01L21/76
摘要：
A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance is disclosed. Further, there is disclosed a method of aligning a lithographic substrate provided with an alignment mark which has a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance, the method including measuring a distance between two of the features on the substrate, comparing the distance with a recorded set of distances, and determining from the comparison the position of the substrate.
公开/授权文献
- US20070031743A1 Alignment and alignment marks 公开/授权日：2007-02-08
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