发明授权
- 专利标题: Method of generating discharge plasma
- 专利标题(中): 产生放电等离子体的方法
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申请号: US11653833申请日: 2007-01-17
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公开(公告)号: US07750574B2公开(公告)日: 2010-07-06
- 发明人: Takao Saito , Tatsuya Terazawa , Yoshimasa Kondo
- 申请人: Takao Saito , Tatsuya Terazawa , Yoshimasa Kondo
- 申请人地址: JP Nagoya
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya
- 代理机构: Oliff & Berridge PLC
- 优先权: JPP2006-012264 20060120
- 主分类号: H05B31/26
- IPC分类号: H05B31/26
摘要:
A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm−3 or larger and an electron temperature of 1.5 eV or lower at a supplied power of 1.0 W/cm2 or more per a unit area of a discharge electrode.
公开/授权文献
- US20070175587A1 Method of generating discharge plasma 公开/授权日:2007-08-02
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