Invention Grant
- Patent Title: Electron emission element, charging device, process cartridge, and image forming apparatus
- Patent Title (中): 电子发射元件,充电装置,处理盒和成像装置
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Application No.: US11692654Application Date: 2007-03-28
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Publication No.: US07728503B2Publication Date: 2010-06-01
- Inventor: Eiichi Ohta , Takuro Sekiya , Naomi Sugimoto , Yukimichi Someya , Shohji Tanaka , Yasuo Katano , Yoshihiko Iijima , Toshihiro Ishii
- Applicant: Eiichi Ohta , Takuro Sekiya , Naomi Sugimoto , Yukimichi Someya , Shohji Tanaka , Yasuo Katano , Yoshihiko Iijima , Toshihiro Ishii
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-091303 20060329; JP2006-091315 20060329
- Main IPC: H01J1/62
- IPC: H01J1/62

Abstract:
An electron emission element according to the present invention is compact, thin and low cost, and has a structure and constitution in which deterioration of the electron emission material itself is low. In the electron emission element, boron nitride material is used as the electron emission material, and a metal material or a semiconductor material is used as a substrate for forming the boron nitride material. In this way it is possible to obtain good quality boron nitride material on the substrate. Also, a voltage can be applied to the material to emit electrons, also electrons can be supplied. Moreover, by using Sp3-bonded boron nitride as the boron nitride material, and using Sp3-bonded 5H—BN material or Sp3-bonded 6H—BN material as the Sp3-bonded boron nitride, a field electron emission element can be achieved for which high efficiency electron emission characteristics unprecedented in conventional art can be obtained.
Public/Granted literature
- US20070231010A1 ELECTRON EMISSION ELEMENT, CHARGING DEVICE, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS Public/Granted day:2007-10-04
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