发明授权
- 专利标题: Radiation apparatus
- 专利标题(中): 辐射装置
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申请号: US11579256申请日: 2005-05-04
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公开(公告)号: US07692170B2公开(公告)日: 2010-04-06
- 发明人: Rainer Gaus , Wolfgang Mohr , Guenther Gesell , Thomas Klingenberg
- 申请人: Rainer Gaus , Wolfgang Mohr , Guenther Gesell , Thomas Klingenberg
- 申请人地址: DE Bruckmuehl
- 专利权人: Advanced Photonics Technologies AG
- 当前专利权人: Advanced Photonics Technologies AG
- 当前专利权人地址: DE Bruckmuehl
- 代理机构: Dennison, Schultz & MacDonald
- 代理商 George H. Spencer
- 优先权: DE102004021845 20050504
- 国际申请: PCT/EP2005/004888 WO 20050504
- 国际公布: WO2005/105448 WO 20051110
- 主分类号: B41F23/04
- IPC分类号: B41F23/04
摘要:
Disclosed is a radiation apparatus for technical uses, especially a UV crosslinking apparatus of a printing press, coating machine, or similar. Said radiation apparatus comprises at least one radiation source emitting a processing radiation, at least one controllable and particularly wavelength-selective reflector which is assigned to the radiation source and is used for selectively directing the processing radiation onto a substrate that is to be processed or away therefrom, a driving mechanism which is effectively connected to the reflector, and a housing accommodating at least the at least one radiation source and the at least one reflector. At least one first and second radiation source are provided between which the controllable reflector is disposed and which can be operated above all in a separate manner. The reflector is formed and mounted so as to direct the processing radiation of all radiation sources towards the substrate in a first position while directing the processing radiation of all radiation sources away from the substrate in a second position.
公开/授权文献
- US20070214986A1 Radiation Apparatus 公开/授权日:2007-09-20
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