A scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts provides improved artifact detection and increased scanning speed in interferometric measurement systems. A scatterometer and interferometer are combined in a single measurement head and may have overlapping, concentric or separate measurement spots. Interferometric sampling of a surface under measurement may be initiated in response to detection of a surface artifact by the scatterometer, so that continuous scanning of the surface under measurement can be performed until further information about the size and/or height of the artifact is needed.