Invention Grant
- Patent Title: Gas monitoring apparatus and gas monitoring method
- Patent Title (中): 气体监测仪和气体监测方法
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Application No.: US11704351Application Date: 2007-02-09
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Publication No.: US07663098B2Publication Date: 2010-02-16
- Inventor: Yasuo Seto , Isaac Ohsawa , Hiroshi Sekiguchi , Hisashi Maruko , Yasuaki Takada , Akihiko Okumura , Hidehiro Okada , Hisashi Nagano , Izumi Waki
- Applicant: Yasuo Seto , Isaac Ohsawa , Hiroshi Sekiguchi , Hisashi Maruko , Yasuaki Takada , Akihiko Okumura , Hidehiro Okada , Hisashi Nagano , Izumi Waki
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2006-237892 20060901
- Main IPC: H01J49/00
- IPC: H01J49/00 ; G01N1/22
Abstract:
A gas monitoring apparatus capable of real-time detection of a kind of chemical warfare agent, namely diphenylcyanoarsine (DC) and/or diphenylchloroarsine (DA). Atmospheric pressure chemical ionization mass spectrometry is carried out in the positive ionization mode, the total amount of DC and DA is determined from the intensity of an ion common to DC and DA, the DC concentration is determined from the intensity of an ion specific to DC, and the difference between them is regarded as the DA concentration.
Public/Granted literature
- US20080054172A1 Gas monitoring apparatus and gas monitoring method Public/Granted day:2008-03-06
Information query
