发明授权
- 专利标题: Active structure of a semiconductor device
- 专利标题(中): 半导体器件的主动结构
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申请号: US11771484申请日: 2007-06-29
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公开(公告)号: US07652352B2公开(公告)日: 2010-01-26
- 发明人: Whee Won Cho , Seong Hwan Myung , Eun Jung Ko
- 申请人: Whee Won Cho , Seong Hwan Myung , Eun Jung Ko
- 申请人地址: KR Icheon-si
- 专利权人: Hynix Semiconductor Inc.
- 当前专利权人: Hynix Semiconductor Inc.
- 当前专利权人地址: KR Icheon-si
- 代理机构: Marshall, Gerstein & Borun LLP
- 优先权: KR10-2007-0025117 20070314
- 主分类号: H01L29/06
- IPC分类号: H01L29/06
摘要:
An active structure of a semiconductor device. In one aspect, the active structure of the semiconductor device includes first to (n)th field regions, and first to (n+1)th active regions formed alternately with the first to (n)th field regions, wherein one or more of the first to (n+1)th active regions are connected at edge portions thereof to close one or more of the field regions. In another aspect, the active structure of the semiconductor device includes first to (n)th field regions, and first to (n+1)th active regions formed alternately with the first to (n)th field regions, wherein the first and (n+1)th active regions are connected to (n+2)th and (n+3)th active regions at edge portions thereof, closing the field regions.
公开/授权文献
- US20080224272A1 Active Structure of a Semiconductor Device 公开/授权日:2008-09-18
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