发明授权
US07649973B1 Apparatus and method for z-location dependent x-ray beam filtration for imaging system
有权
用于成像系统的z位置相关x射线束过滤的装置和方法
- 专利标题: Apparatus and method for z-location dependent x-ray beam filtration for imaging system
- 专利标题(中): 用于成像系统的z位置相关x射线束过滤的装置和方法
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申请号: US12244569申请日: 2008-10-02
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公开(公告)号: US07649973B1公开(公告)日: 2010-01-19
- 发明人: Baojun Li , Thomas Louis Toth , Jiang Hsieh
- 申请人: Baojun Li , Thomas Louis Toth , Jiang Hsieh
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: The Small Patent Law Group
- 代理商 Dean D. Small
- 主分类号: G01N23/083
- IPC分类号: G01N23/083
摘要:
An imaging system includes at least two x-ray sources, an x-ray detector assembly and an attenuation filter. The at least two x-ray sources are displaced along a z-axis and configured to alternately emit x-ray beams. The x-ray detector assembly is configured to detect the x-ray beams. The attenuation filter is mounted proximate the at least two x-ray sources and is configured to provide different amounts of x-ray attenuation to the x-ray beams along the z-axis.
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