- 专利标题: Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
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申请号: US11984942申请日: 2007-11-26
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公开(公告)号: US07521282B2公开(公告)日: 2009-04-21
- 发明人: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- 申请人: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- 申请人地址: JP Tokyo
- 专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch and Birch, LLP
- 优先权: JP2001-106295 20010404; JP2001-204419 20010705; JP2001-330193 20011029; JP2001-330194 20011029
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
The present invention relates to a method for producing an n-type ZnTe system compound semiconductor single crystal having high carrier concentration and low resistivity, the ZnTe system compound semiconductor single crystal, and a semiconductor device produced by using the ZnTe system compound semiconductor as a base member. Concretely, a first dopant and a second dopant are co-doped into the ZnTe system compound semiconductor single crystal so that the number of atoms of the second dopant becomes smaller than the number of atoms of the first dopant, the first dopant being for controlling a conductivity type of the ZnTe system compound semiconductor to a first conductivity type, and the second dopant being for controlling the conductivity type to a second conductivity type different from the first conductivity type. By the present invention, a desired carrier concentration can be achieved with a doping amount smaller than in earlier technology, and crystallinity of the obtained crystal can be improved.
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