A placement configuration of MIM type capacitance elements comprises a group of first capacitance elements in which the first capacitance elements as the MIM type capacitance elements are placed in tandem and a group of second capacitance elements in which the second capacitance elements as the MIM type capacitance elements are placed in tandem, wherein the group of first capacitance elements and the group of second capacitance elements are alternately placed in parallel with each other with an equal interval therebetween.