Invention Grant
US07507522B2 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
有权
光聚合物包含衍生自氟代醇取代的多环单体的聚合物
- Patent Title: Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
- Patent Title (中): 光聚合物包含衍生自氟代醇取代的多环单体的聚合物
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Application No.: US11578278Application Date: 2005-05-17
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Publication No.: US07507522B2Publication Date: 2009-03-24
- Inventor: Michael Karl Crawford , Hoang Vi Tran , Frank Leonard Schadt, III , Fredrick Claus Zumsteg, Jr. , Andrew Edward Feiring , Michael Fryd
- Applicant: Michael Karl Crawford , Hoang Vi Tran , Frank Leonard Schadt, III , Fredrick Claus Zumsteg, Jr. , Andrew Edward Feiring , Michael Fryd
- Applicant Address: US DE Wilmington
- Assignee: E. I. DuPont de Nemours and Company
- Current Assignee: E. I. DuPont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- International Application: PCT/US2005/017325 WO 20050517
- International Announcement: WO2005/118656 WO 20051215
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
Public/Granted literature
- US20070207413A1 Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers Public/Granted day:2007-09-06
Information query
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