发明授权
- 专利标题: Amide compounds and medications containing the same
- 专利标题(中): 酰胺化合物和含有相同的药物
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申请号: US10985938申请日: 2004-11-09
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公开(公告)号: US07393866B2公开(公告)日: 2008-07-01
- 发明人: Kimiyuki Shibuya , Toru Miura , Katsumi Kawamine , Yukihiro Sato , Tadaaki Ohgiya , Takahiro Kitamura , Chiyoka Ozaki , Toshiyuki Edano , Mitsuteru Hirata
- 申请人: Kimiyuki Shibuya , Toru Miura , Katsumi Kawamine , Yukihiro Sato , Tadaaki Ohgiya , Takahiro Kitamura , Chiyoka Ozaki , Toshiyuki Edano , Mitsuteru Hirata
- 申请人地址: JP Aichi
- 专利权人: Kowa Company, Ltd.
- 当前专利权人: Kowa Company, Ltd.
- 当前专利权人地址: JP Aichi
- 代理机构: Edwards, Angell, Palmer & Dodge, LLP
- 代理商 Peter F. Corless; Christine O'Day
- 主分类号: A61K31/4436
- IPC分类号: A61K31/4436 ; C07D417/12
摘要:
The present invention provides to a novel compound having an ACAT inhibiting activity.The present invention relates to compounds represented by formula (I) wherein represents an optionally substituted divalent residue such as benzene, pyridine, cyclohexane or naphthalene, or a group, Het represents a 5- to 8-membered, substituted or unsubstituted heterocyclic group containing at least one heteroatom selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom, such as a monocyclic group, a polycyclic group or a group of a fused ring, X represents —NH—, an oxygen atom or a sulfur atom, Y represents —NR4—, an oxygen atom, a sulfur atom, a sulfoxide or a sulfone, Z represents a single bond or —NR5—, R4 represents a hydrogen atom, a lower alkyl group, an aryl group or an optionally substituted silyl lower alkyl group, R5 represents a hydrogen atom, a lower alkyl group, an aryl group or an optionally substituted silyl lower alkyl group, and n is an integer of from 1 to 15, or salts or solvates thereof, and a pharmaceutical composition containing at least one of these compounds.
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