发明授权
- 专利标题： Positive resist composition
- 专利标题（中）： 正抗蚀剂组成
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申请号： US10809389申请日： 2004-03-26
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公开(公告)号： US07338740B2公开(公告)日： 2008-03-04
- 发明人: Hajime Nakao , Makoto Momota
- 申请人： Hajime Nakao , Makoto Momota
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JPP.2003-089021 20030327
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004
摘要：
A positive resist composition comprising (A) a resin comprising at least one kind of acrylate derivative repeating units, repeating units having lactone structures and repeating units having hydroxy group-substituted adamantane structures, having a glass transition temperature in the range of 70 to 155° C. and capable of increasing its solubility in an alkali developer under action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) an organic solvent.
公开/授权文献
- US20040191676A1 Positive resist composition 公开/授权日：2004-09-30
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