Invention Grant
- Patent Title: Anti-reflective coating doped with carbon for use in integrated circuit technology and method of formation
- Patent Title (中): 掺杂碳的抗反射涂层用于集成电路技术和形成方法
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Application No.: US11216914Application Date: 2005-08-31
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Publication No.: US07282439B2Publication Date: 2007-10-16
- Inventor: Ronald A. Weimer , John T. Moore
- Applicant: Ronald A. Weimer , John T. Moore
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt, PC
- Main IPC: H01L21/4763
- IPC: H01L21/4763 ; H01L21/311
Abstract:
The invention pertains to films comprising silicon, oxygen and carbon and the use of the films in integrated circuit technology, such as capacitor constructions, DRAM constructions, semiconductive material assemblies, etching processes, and methods for forming capacitors, DRAMs and semiconductive material assemblies. One particular disclosed film is an anti-reflective coating, and a method of formation thereof.
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