Invention Grant
- Patent Title: Apparatus and method for slicing an ingot
- Patent Title (中): 用于切割锭的装置和方法
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Application No.: US11256331Application Date: 2005-10-21
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Publication No.: US07261099B2Publication Date: 2007-08-28
- Inventor: Eunsang Ji , Kyungmoo Lee
- Applicant: Eunsang Ji , Kyungmoo Lee
- Applicant Address: KR Kumi
- Assignee: Siltron Inc.
- Current Assignee: Siltron Inc.
- Current Assignee Address: KR Kumi
- Agency: Christie, Parker & Hale, LLP
- Priority: KR10-2004-0096218 20041123
- Main IPC: B28D1/06
- IPC: B28D1/06

Abstract:
A method for slicing an ingot may improve nanotopography at a surface of a wafer. In the method, an ingot is sliced into a plurality of wafers via a slurry while slurry is supplied to a moving wire. A first wire to form a first slicing portion at the wafer firstly slices one side of the ingot. A second wire secondly slices the remaining portion of the ingot to form a second slicing portion continued from the first slicing portion, wherein the first wire has a smaller diameter than that of the second wire.
Public/Granted literature
- US20060107940A1 Apparatus and method for slicing an ingot Public/Granted day:2006-05-25
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