Invention Grant
- Patent Title: Exposure apparatus of an optical disk master, method of exposing an optical disk master, and wavefront fluctuation correction mechanism
- Patent Title (中): 光盘主机的曝光装置，曝光光盘主机的方法以及波前波动校正机构
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Application No.: US10975605Application Date: 2004-10-28
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Publication No.: US07236434B2Publication Date: 2007-06-26
- Inventor: Masahiko Tsukuda , Shinya Abe , Morio Tomiyama , Shuji Sato , Eiichi Ito
- Applicant: Masahiko Tsukuda , Shinya Abe , Morio Tomiyama , Shuji Sato , Eiichi Ito
- Applicant Address: JP Osaka
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: RatnerPrestia
- Priority: JP2001-198153 20010629
- Main IPC: G11B7/26
- IPC: G11B7/26 ; G11B7/135
Abstract:
Apparatus and method for exposing an optical disk master having a laser source, a deflector for deflecting a recording laser beam based on the laser beam of the laser source and an objective lens for focusing the recording laser beam on an optical disk master, including a liquid crystal plate provided between the laser source and the deflector, a parallel flat plate provided between the deflector and the objective lens, a photodetector that detects reflected light from the parallel flat plate, and an adjusting device for adjusting a voltage applied to the liquid crystal plate based on information on wavefront fluctuation of the recording laser beam detected by the photodetector.
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