Invention Grant
- Patent Title: Fabrication of self-aligned reflective/protective overlays on magnetoresistance sensors
- Patent Title (中): 在磁阻传感器上制作自对准反射/保护覆盖层
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Application No.: US11146656Application Date: 2005-06-06
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Publication No.: US07198818B2Publication Date: 2007-04-03
- Inventor: Witold Kula , Alexander Michael Zeltser
- Applicant: Witold Kula , Alexander Michael Zeltser
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: B05D5/12
- IPC: B05D5/12

Abstract:
A magnetoresistance sensor is fabricated using a sensor structure including a free layer deposited upon a lower layered structure and depositing an oxide structure overlying the free layer. The depositing of the oxide structure includes the steps of depositing a buffer layer overlying the free layer, wherein the buffer layer is a buffer-layer metal when deposited, depositing an overlayer overlying and contacting the buffer layer, the overlayer being an overlayer metallic oxide of an overlayer metal, and oxidizing the buffer layer to form a buffer layer metallic oxide.
Public/Granted literature
- US20050226998A1 Fabrication of self-aligned reflective/protective overlays on magnetoresistance sensors, and the sensors Public/Granted day:2005-10-13
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