发明授权
US07172731B2 Apparatus for releasing pressure in a vacuum exhaust system of semiconductor equipment
有权
用于在半导体设备的真空排气系统中释放压力的装置
- 专利标题: Apparatus for releasing pressure in a vacuum exhaust system of semiconductor equipment
- 专利标题(中): 用于在半导体设备的真空排气系统中释放压力的装置
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申请号: US10318185申请日: 2002-12-13
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公开(公告)号: US07172731B2公开(公告)日: 2007-02-06
- 发明人: Chen-Tai Peng , Leo Lin , Eric T. Chuang
- 申请人: Chen-Tai Peng , Leo Lin , Eric T. Chuang
- 申请人地址: TW Hsin-Chu
- 专利权人: United Microelectronics Corp.
- 当前专利权人: United Microelectronics Corp.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Nath & Associates PLLC
- 代理商 Harold L. Novick
- 主分类号: B32B5/02
- IPC分类号: B32B5/02
摘要:
An apparatus for protecting a vacuum system of semiconductor equipment is disclosed. The apparatus comprises a process tool and a gas-exploding unit. The process tool includes a gas reaction chamber, and the process tool is connected with a first gas piping to exhaust a waste gas in the gas reaction chamber. The gas-exploding unit includes a gas-exploding chamber, a gas valve, a pressure sensor, and a gas-exploding device for sealing an opening in a wall of the gas-exploding chamber. The gas-exploding chamber is connected with the first gas piping to receive the waste gas. The waste gas in the gas-exploding chamber is transported to a local scrubber through a second gas piping, and then exhausted to a central scrubber. The pressure sensor is used to detect a pressure in the gas-exploding chamber. While the pressure in the gas-exploding chamber detected by the pressure sensor is larger than a reference value, the process tool is shutdown, and the gas valve is then opened to release the waste gas to the central scrubber through a third gas piping.
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