Invention Grant
US07169543B2 Blocked aliphatic thiol stabilizers for photothermographic materials
失效
用于光热敏成像材料的封闭的脂族硫醇稳定剂
- Patent Title: Blocked aliphatic thiol stabilizers for photothermographic materials
- Patent Title (中): 用于光热敏成像材料的封闭的脂族硫醇稳定剂
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Application No.: US11025633Application Date: 2004-12-29
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Publication No.: US07169543B2Publication Date: 2007-01-30
- Inventor: William D. Ramsden , James B. Philip, Jr. , Doreen C. Lynch , Kui Chen-Ho , Stacy M. Ulrich , Kumars Sakizadeh , Jeffrey W. Leon , George J. Burgmaier
- Applicant: William D. Ramsden , James B. Philip, Jr. , Doreen C. Lynch , Kui Chen-Ho , Stacy M. Ulrich , Kumars Sakizadeh , Jeffrey W. Leon , George J. Burgmaier
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker; Louis M. Leichter
- Main IPC: G03C5/16
- IPC: G03C5/16 ; G03C1/498 ; G03C1/34
Abstract:
Photothermographic materials contain one or more blocked aliphatic thiol compounds in an amount of at least 1 mg/m2 as stabilizers. These compounds have a calculated octanol-water partition coefficient (c log P value) of 2.0 or greater, and an N value equal to or greater than 6.5.
Public/Granted literature
- US20060141403A1 Blocked aliphatic thiol stabilizers for photothermographic materials Public/Granted day:2006-06-29
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