发明授权
US07127830B2 Reticle carrier apparatus and method that tilts reticle for drying
有权
刻线载体装置和方法，使标线倾斜干燥
- 专利标题： Reticle carrier apparatus and method that tilts reticle for drying
- 专利标题（中）： 刻线载体装置和方法，使标线倾斜干燥
-
申请号： US10910221申请日： 2004-08-02
-
公开(公告)号： US07127830B2公开(公告)日： 2006-10-31
- 发明人: Hai Tran
- 申请人： Hai Tran
- 申请人地址： US WA Camas
- 专利权人： WaferTech, LLC
- 当前专利权人： WaferTech, LLC
- 当前专利权人地址： US WA Camas
- 代理机构： Duane Morris LLP
- 主分类号： F26B21/06
- IPC分类号： F26B21/06
摘要：
A method and apparatus for cleaning, rinsing and drying a reticle used in semiconductor device manufacturing, tilts the reticle during the drying process to prevent water from the rinsing process from collecting and remaining on the reticle. The rectangularly shaped reticle is held in a carrier and the top and bottom edges of the reticle may form an angle of at least about 8° with the horizontal to maximize drying efficiency, when the carrier is placed on a horizontal surface or suspended from above.
公开/授权文献
信息查询
IPC分类:
