发明授权
- 专利标题: Plating rack with rotatable insert
- 专利标题(中): 带旋转插件的电镀架
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申请号: US10266884申请日: 2002-10-08
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公开(公告)号: US07097749B2公开(公告)日: 2006-08-29
- 发明人: Lawrence P. Donovan, III , David P. Hartrick , John A. Piselli , Brian Ellison
- 申请人: Lawrence P. Donovan, III , David P. Hartrick , John A. Piselli , Brian Ellison
- 申请人地址: US MI Grand Rapids
- 专利权人: Lacks Enterprises, Inc.
- 当前专利权人: Lacks Enterprises, Inc.
- 当前专利权人地址: US MI Grand Rapids
- 主分类号: C25D17/08
- IPC分类号: C25D17/08
摘要:
A processing rack, such as for electroplating, which minimizes shelf areas of an article during processing of the article and during removal of the article from a processing bath and which allows easy mounting of articles on the rack and demounting of articles from the rack includes a frame and a plurality of article mounting fixtures that are each pivotally mounted on the frame and independently pivotable from a first orientation that facilitates mounting and/or demounting of articles, to a second orientation that is most conducive to producing high quality, substantially defect-free plating.
公开/授权文献
- US20040065557A1 Plating rack with rotatable insert 公开/授权日:2004-04-08
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