发明授权
- 专利标题: Method for manufacturing self-compensating resistors within an integrated circuit
- 专利标题(中): 在集成电路内制造自补偿电阻的方法
-
申请号: US10709039申请日: 2004-04-08
-
公开(公告)号: US07052925B2公开(公告)日: 2006-05-30
- 发明人: William J. Murphy , Edmund J. Sprogis , Anthony K. Stamper , Erick G. Walton
- 申请人: William J. Murphy , Edmund J. Sprogis , Anthony K. Stamper , Erick G. Walton
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Dillon & Yudell LLP
- 代理商 Anthony J. Canale
- 主分类号: H01L31/26
- IPC分类号: H01L31/26
摘要:
A method for manufacturing a self-compensating resistor within an integrated circuit is disclosed. The self-compensating resistor includes a first resistor and a second resistor. The first resistor having a first resistance value is initially formed, and then the second resistor having a second resistance value is subsequently formed. The second resistor is connected in series with the first resistor. The second resistance value is less than the first resistance value, but the total resistance value of the first and second resistors lies beyond a desired target resistance range. Finally, an electric current is sent to the second resistor to change the dimension of the second resistor such that the total resistance value of the first and second resistors falls within the desired target resistance range.
公开/授权文献
信息查询