Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US10860112Application Date: 2004-06-04
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Publication No.: US06995436B2Publication Date: 2006-02-07
- Inventor: Toshiaki Kawasaki
- Applicant: Toshiaki Kawasaki
- Applicant Address: JP Kadoma
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JP Kadoma
- Agency: Steptoe & Johnson LLP
- Priority: JP2003-158735 20030604
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
In a memory cell, the substrate contact region of an NMOS transistor and the well contact region of a PMOS transistor are arranged perpendicularly to a floating gate. In a cell array, the memory cell and another memory cell arranged axisymmetrically with respect to the memory cell are alternately arranged in the column direction to constitute a sub array, and the sub arrays arranged in the column direction are arranged in parallel or axisymmetically in the row direction. With this arrangement, the substrate contact region, the well contact region, and the diffusion region of the PMOS transistor can be shared between the adjacent memory cells, thereby reducing the area of the cell array.
Public/Granted literature
- US20040245567A1 Nonvolatile semiconductor memory device Public/Granted day:2004-12-09
Information query
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